A novel radio-frequency plasma probe for monitoring systems in dielectric deposition processes

Research output: Contributions to collected editions/worksArticle in conference proceedingsResearchpeer-review

Authors

  • C. Schulz
  • T. Styrnoll
  • M. Lapke
  • Jens Oberrath
  • R. Storch
  • P. Awakowicz
  • R. P. Brinkmann
  • T. Musch
  • T. Mussenbrock
  • I. Rolfes
This paper presents a novel industry compatible plasma probe for monitoring systems in dielectric deposition processes. The probe is based on the so called active plasma resonance spectroscopy and allows an extensive evaluation of different important plasma parameters, needed for the supervision and control of the plasma deposition process. Due to its assembly, the probe is insensitive against additional dielectric coating. Hence, the measurement performance is not affected. 3D-electromagnetic field simulations of the probe in a pseudo plasma deposition process, as well as the measurement with a prototype in a real deposition process show a good agreement with the expected behaviour and confirm the applicability of the probe as a monitoring tool for dielectric deposition processes. © 2012 IEEE.
Original languageEnglish
Title of host publicationProceedings of the 2012 International Conference on Electromagnetics in Advanced Applications, ICEAA'12 : ICEAA '12
Number of pages4
Volume2
PublisherIEEE - Institute of Electrical and Electronics Engineers Inc.
Publication date2012
Pages728-731
ISBN (print)978-1-4673-0333-0
ISBN (electronic)978-1-4673-0334-7, 978-1-4673-0335-4
DOIs
Publication statusPublished - 2012
Externally publishedYes
Event14th International Conference on Electromagnetics in Advanced Applications - ICEAA 2012 - Cape Town, South Africa
Duration: 02.09.201207.09.2012
Conference number: 14
https://ieeexplore.ieee.org/document/6645154