The multipole resonance probe: Characterization of a prototype
Publikation: Beiträge in Zeitschriften › Kommentare / Debatten / Berichte › Forschung
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in: Plasma Sources Science and Technology, Jahrgang 20, Nr. 4, 042001, 08.2011.
Publikation: Beiträge in Zeitschriften › Kommentare / Debatten / Berichte › Forschung
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TY - JOUR
T1 - The multipole resonance probe
T2 - Characterization of a prototype
AU - Lapke, Martin
AU - Oberrath, Jens
AU - Schulz, Christian
AU - Storch, Robert
AU - Styrnoll, Tim
AU - Zietz, Christian
AU - Awakowicz, Peter
AU - Brinkmann, Ralf Peter
AU - Musch, Thomas
AU - Mussenbrock, Thomas
AU - Rolfes, Ilona
PY - 2011/8
Y1 - 2011/8
N2 - The multipole resonance probe (MRP) was recently proposed as an economical and industry compatible plasma diagnostic device (Lapke et al 2008 Appl. Phys. Lett. 93 051502). This communication reports the experimental characterization of a first MRP prototype in an inductively coupled argon/nitrogen plasma at 10 Pa. The behavior of the device follows the predictions of both an analytical model and a numerical simulation. The obtained electron densities are in excellent agreement with the results of Langmuir probe measurements. © 2011 IOP Publishing Ltd.
AB - The multipole resonance probe (MRP) was recently proposed as an economical and industry compatible plasma diagnostic device (Lapke et al 2008 Appl. Phys. Lett. 93 051502). This communication reports the experimental characterization of a first MRP prototype in an inductively coupled argon/nitrogen plasma at 10 Pa. The behavior of the device follows the predictions of both an analytical model and a numerical simulation. The obtained electron densities are in excellent agreement with the results of Langmuir probe measurements. © 2011 IOP Publishing Ltd.
KW - Engineering
UR - http://www.scopus.com/inward/record.url?scp=80051637894&partnerID=8YFLogxK
UR - https://www.mendeley.com/catalogue/f90f82be-6a12-30b5-923c-b1df75ad11b0/
U2 - 10.1088/0963-0252/20/4/042001
DO - 10.1088/0963-0252/20/4/042001
M3 - Comments / Debate / Reports
AN - SCOPUS:80051637894
VL - 20
JO - Plasma Sources Science and Technology
JF - Plasma Sources Science and Technology
SN - 0963-0252
IS - 4
M1 - 042001
ER -