A Stacked Planar Sensor Concept for Minimally Invasive Plasma Monitoring
Publikation: Beiträge in Sammelwerken › Aufsätze in Konferenzbänden › Forschung › begutachtet
Standard
2018 Asia-Pacific Microwave Conference, APMC 2018 - Proceedings. Piscataway: IEEE - Institute of Electrical and Electronics Engineers Inc., 2019. S. 1315-1317 8617552 (Asia-Pacific Microwave Conference Proceedings, APMC; Band 2018-November).
Publikation: Beiträge in Sammelwerken › Aufsätze in Konferenzbänden › Forschung › begutachtet
Harvard
APA
Vancouver
Bibtex
}
RIS
TY - CHAP
T1 - A Stacked Planar Sensor Concept for Minimally Invasive Plasma Monitoring
AU - Pohle, Dennis
AU - Schulz, Christian
AU - Oberberg, Moritz
AU - Friedrichs, Michael
AU - Serwa, Alexandra
AU - Uhlig, Peter
AU - Oberrath, Jens
AU - Awakowicz, Peter
AU - Rolfes, Ilona
N1 - Conference code: 30
PY - 2019/1/16
Y1 - 2019/1/16
N2 - A novel advanced design of the planar multipole resonance probe (pMRP) using LTCC-technology is investigated in this contribution. Integrated into the reactor wall, the planar sensor structure enables a minimally invasive in-situ plasma monitoring. Due to the ceramic substrate material, a substantial improved resistance against high temperatures can be achieved, extending the potential fields of application. The used multilayer structure with vertically stacked components ensures a high level of integration and further enhances the mechanical robustness leading to an industry compatible plasma sensor design. The probe is investigated within 3D electromagnetic simulations and its applicability is demonstrated by measurements in a double inductively coupled plasma (DICP).
AB - A novel advanced design of the planar multipole resonance probe (pMRP) using LTCC-technology is investigated in this contribution. Integrated into the reactor wall, the planar sensor structure enables a minimally invasive in-situ plasma monitoring. Due to the ceramic substrate material, a substantial improved resistance against high temperatures can be achieved, extending the potential fields of application. The used multilayer structure with vertically stacked components ensures a high level of integration and further enhances the mechanical robustness leading to an industry compatible plasma sensor design. The probe is investigated within 3D electromagnetic simulations and its applicability is demonstrated by measurements in a double inductively coupled plasma (DICP).
KW - Engineering
KW - Multipole resonance probe
KW - Plasma diagnostics
UR - https://ieeexplore.ieee.org/document/8617552
UR - http://www.scopus.com/inward/record.url?scp=85061816491&partnerID=8YFLogxK
U2 - 10.23919/APMC.2018.8617552
DO - 10.23919/APMC.2018.8617552
M3 - Article in conference proceedings
SN - 978-1-5386-2184-4
T3 - Asia-Pacific Microwave Conference Proceedings, APMC
SP - 1315
EP - 1317
BT - 2018 Asia-Pacific Microwave Conference, APMC 2018 - Proceedings
PB - IEEE - Institute of Electrical and Electronics Engineers Inc.
CY - Piscataway
T2 - 30th Asia-Pacific Microwave Conference 2018
Y2 - 6 November 2018 through 9 November 2018
ER -