A novel radio-frequency plasma probe for monitoring systems in dielectric deposition processes
Publikation: Beiträge in Sammelwerken › Aufsätze in Konferenzbänden › Forschung › begutachtet
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A novel radio-frequency plasma probe for monitoring systems in dielectric deposition processes. / Schulz, C.; Styrnoll, T.; Lapke, M. et al.
Proceedings of the 2012 International Conference on Electromagnetics in Advanced Applications, ICEAA'12: ICEAA '12. Band 2 IEEE - Institute of Electrical and Electronics Engineers Inc., 2012. S. 728-731.Publikation: Beiträge in Sammelwerken › Aufsätze in Konferenzbänden › Forschung › begutachtet
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TY - CHAP
T1 - A novel radio-frequency plasma probe for monitoring systems in dielectric deposition processes
AU - Schulz, C.
AU - Styrnoll, T.
AU - Lapke, M.
AU - Oberrath, Jens
AU - Storch, R.
AU - Awakowicz, P.
AU - Brinkmann, R. P.
AU - Musch, T.
AU - Mussenbrock, T.
AU - Rolfes, I.
N1 - Conference code: 14
PY - 2012
Y1 - 2012
N2 - This paper presents a novel industry compatible plasma probe for monitoring systems in dielectric deposition processes. The probe is based on the so called active plasma resonance spectroscopy and allows an extensive evaluation of different important plasma parameters, needed for the supervision and control of the plasma deposition process. Due to its assembly, the probe is insensitive against additional dielectric coating. Hence, the measurement performance is not affected. 3D-electromagnetic field simulations of the probe in a pseudo plasma deposition process, as well as the measurement with a prototype in a real deposition process show a good agreement with the expected behaviour and confirm the applicability of the probe as a monitoring tool for dielectric deposition processes. © 2012 IEEE.
AB - This paper presents a novel industry compatible plasma probe for monitoring systems in dielectric deposition processes. The probe is based on the so called active plasma resonance spectroscopy and allows an extensive evaluation of different important plasma parameters, needed for the supervision and control of the plasma deposition process. Due to its assembly, the probe is insensitive against additional dielectric coating. Hence, the measurement performance is not affected. 3D-electromagnetic field simulations of the probe in a pseudo plasma deposition process, as well as the measurement with a prototype in a real deposition process show a good agreement with the expected behaviour and confirm the applicability of the probe as a monitoring tool for dielectric deposition processes. © 2012 IEEE.
KW - Engineering
UR - http://www.scopus.com/inward/record.url?scp=84868297966&partnerID=8YFLogxK
UR - https://www.mendeley.com/catalogue/071eb4c0-bbb4-3555-88d7-ba5009a9a23c/
U2 - 10.1109/ICEAA.2012.6328725
DO - 10.1109/ICEAA.2012.6328725
M3 - Article in conference proceedings
AN - SCOPUS:84868297966
SN - 978-1-4673-0333-0
VL - 2
SP - 728
EP - 731
BT - Proceedings of the 2012 International Conference on Electromagnetics in Advanced Applications, ICEAA'12
PB - IEEE - Institute of Electrical and Electronics Engineers Inc.
T2 - 14th International Conference on Electromagnetics in Advanced Applications - ICEAA 2012
Y2 - 2 September 2012 through 7 September 2012
ER -