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A novel radio-frequency plasma probe for monitoring systems in dielectric deposition processes

Publikation: Beiträge in Sammelwerken › Aufsätze in Konferenzbänden › Forschung › begutachtet

Standard

A novel radio-frequency plasma probe for monitoring systems in dielectric deposition processes. / Schulz, C.; Styrnoll, T.; Lapke, M. et al.
Proceedings of the 2012 International Conference on Electromagnetics in Advanced Applications, ICEAA'12: ICEAA '12. Band 2 IEEE - Institute of Electrical and Electronics Engineers Inc., 2012. S. 728-731.

Publikation: Beiträge in Sammelwerken › Aufsätze in Konferenzbänden › Forschung › begutachtet

Harvard

Schulz, C, Styrnoll, T, Lapke, M, Oberrath, J, Storch, R, Awakowicz, P, Brinkmann, RP, Musch, T, Mussenbrock, T & Rolfes, I 2012, A novel radio-frequency plasma probe for monitoring systems in dielectric deposition processes. in Proceedings of the 2012 International Conference on Electromagnetics in Advanced Applications, ICEAA'12: ICEAA '12. Bd. 2, IEEE - Institute of Electrical and Electronics Engineers Inc., S. 728-731, 14th International Conference on Electromagnetics in Advanced Applications - ICEAA 2012 , Cape Town, Südafrika, 02.09.12. https://doi.org/10.1109/ICEAA.2012.6328725

APA

Schulz, C., Styrnoll, T., Lapke, M., Oberrath, J., Storch, R., Awakowicz, P., Brinkmann, R. P., Musch, T., Mussenbrock, T., & Rolfes, I. (2012). A novel radio-frequency plasma probe for monitoring systems in dielectric deposition processes. In Proceedings of the 2012 International Conference on Electromagnetics in Advanced Applications, ICEAA'12: ICEAA '12 (Band 2, S. 728-731). IEEE - Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/ICEAA.2012.6328725

Vancouver

Schulz C, Styrnoll T, Lapke M, Oberrath J, Storch R, Awakowicz P et al. A novel radio-frequency plasma probe for monitoring systems in dielectric deposition processes. in Proceedings of the 2012 International Conference on Electromagnetics in Advanced Applications, ICEAA'12: ICEAA '12. Band 2. IEEE - Institute of Electrical and Electronics Engineers Inc. 2012. S. 728-731 doi: 10.1109/ICEAA.2012.6328725

Bibtex

@inbook{b03f28b9989d4832ac742d7c4bd06d43,
title = "A novel radio-frequency plasma probe for monitoring systems in dielectric deposition processes",
abstract = "This paper presents a novel industry compatible plasma probe for monitoring systems in dielectric deposition processes. The probe is based on the so called active plasma resonance spectroscopy and allows an extensive evaluation of different important plasma parameters, needed for the supervision and control of the plasma deposition process. Due to its assembly, the probe is insensitive against additional dielectric coating. Hence, the measurement performance is not affected. 3D-electromagnetic field simulations of the probe in a pseudo plasma deposition process, as well as the measurement with a prototype in a real deposition process show a good agreement with the expected behaviour and confirm the applicability of the probe as a monitoring tool for dielectric deposition processes. {\textcopyright} 2012 IEEE.",
keywords = "Engineering",
author = "C. Schulz and T. Styrnoll and M. Lapke and Jens Oberrath and R. Storch and P. Awakowicz and Brinkmann, {R. P.} and T. Musch and T. Mussenbrock and I. Rolfes",
year = "2012",
doi = "10.1109/ICEAA.2012.6328725",
language = "English",
isbn = "978-1-4673-0333-0 ",
volume = "2",
pages = "728--731",
booktitle = "Proceedings of the 2012 International Conference on Electromagnetics in Advanced Applications, ICEAA'12",
publisher = "IEEE - Institute of Electrical and Electronics Engineers Inc.",
address = "United States",
note = "14th International Conference on Electromagnetics in Advanced Applications - ICEAA 2012 , ICEAA 2012 ; Conference date: 02-09-2012 Through 07-09-2012",
url = "https://ieeexplore.ieee.org/document/6645154",

}

RIS

TY - CHAP

T1 - A novel radio-frequency plasma probe for monitoring systems in dielectric deposition processes

AU - Schulz, C.

AU - Styrnoll, T.

AU - Lapke, M.

AU - Oberrath, Jens

AU - Storch, R.

AU - Awakowicz, P.

AU - Brinkmann, R. P.

AU - Musch, T.

AU - Mussenbrock, T.

AU - Rolfes, I.

N1 - Conference code: 14

PY - 2012

Y1 - 2012

N2 - This paper presents a novel industry compatible plasma probe for monitoring systems in dielectric deposition processes. The probe is based on the so called active plasma resonance spectroscopy and allows an extensive evaluation of different important plasma parameters, needed for the supervision and control of the plasma deposition process. Due to its assembly, the probe is insensitive against additional dielectric coating. Hence, the measurement performance is not affected. 3D-electromagnetic field simulations of the probe in a pseudo plasma deposition process, as well as the measurement with a prototype in a real deposition process show a good agreement with the expected behaviour and confirm the applicability of the probe as a monitoring tool for dielectric deposition processes. © 2012 IEEE.

AB - This paper presents a novel industry compatible plasma probe for monitoring systems in dielectric deposition processes. The probe is based on the so called active plasma resonance spectroscopy and allows an extensive evaluation of different important plasma parameters, needed for the supervision and control of the plasma deposition process. Due to its assembly, the probe is insensitive against additional dielectric coating. Hence, the measurement performance is not affected. 3D-electromagnetic field simulations of the probe in a pseudo plasma deposition process, as well as the measurement with a prototype in a real deposition process show a good agreement with the expected behaviour and confirm the applicability of the probe as a monitoring tool for dielectric deposition processes. © 2012 IEEE.

KW - Engineering

UR - http://www.scopus.com/inward/record.url?scp=84868297966&partnerID=8YFLogxK

UR - https://www.mendeley.com/catalogue/071eb4c0-bbb4-3555-88d7-ba5009a9a23c/

U2 - 10.1109/ICEAA.2012.6328725

DO - 10.1109/ICEAA.2012.6328725

M3 - Article in conference proceedings

AN - SCOPUS:84868297966

SN - 978-1-4673-0333-0

VL - 2

SP - 728

EP - 731

BT - Proceedings of the 2012 International Conference on Electromagnetics in Advanced Applications, ICEAA'12

PB - IEEE - Institute of Electrical and Electronics Engineers Inc.

T2 - 14th International Conference on Electromagnetics in Advanced Applications - ICEAA 2012

Y2 - 2 September 2012 through 7 September 2012

ER -

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DOI