Measuring plasma parameters, e.g. electron density
and electron temperature, is an important procedure to verify the sta-
bility and behavior of a plasma process. For this purpose the multipole
resonance probe (MRP) represents a satisfying solution. However, the
in
uence of the probe on the plasma due to its physical presence makes
it unattractive for processes in industrial applications. As an improve-
ment the planar design of the MRP (pMRP) was introduced, which
combines the advantages of the spherical MRP with the possibility to
be integrated into the chamber wall of a plasma reactor. To measure
the electron temperature with the pMRP, a kinetic model of the probe-
plasma system is necessary. In this work such a kinetic model based on
a functional analytic description will be presented.