TY - JOUR

T1 - Active Plasma Resonance Spectroscopy

T2 - Evaluation of a fluiddynamic-model of the planar multipole resonance probe using functional analytic methods

AU - Friedrichs, Michael

AU - Brinkmann, Ralf Peter

AU - Oberrath, Jens

N1 - 69th Annual Gaseous Electronics Conference, October 10–14, 2016; Bochum, Germany

PY - 2016

Y1 - 2016

N2 - Active Plasma Resonance Spectroscopy:Evaluation of a uiddynamic-model of the planar multipole resonance probe using func-tional analytic methodsMICHAEL FRIEDRICHS, Institute of Product andProcess Innovation, Leuphana University Lneburg, RALF PETER BRINKMANN,Institute of Theoretical Electrical Engineering, Ruhr-University Bochum,, JENSOBERRATH, Institute of Product and Process Innovation, Leuphana UniversityLneburg | Measuring plasma parameters, e.g. electron density and electron tem-perature, is an important procedure to verify the stability and behavior of a plasmaprocess. For this purpose the multipole resonance probe (MRP) represents a satisfy-ing solution to measure the electron density. However the in uence of the probe onthe plasma through its physical presence makes it unattractive for some processesin industrial application. A solution to combine the bene ts of the spherical MRPwith the ability to integrate the probe into the plasma reactor is introduced bythe planar model of the MRP. By coupling the model of the cold plasma with themaxwell equations for electrostatics an analytical model for the admittance of theplasma is derivated[1 , 2], adjusted to cylindrical geometry and solved analyticallyfor the planar MRP using functional analytic methods. [1]: M. Lapke et al. , PlasmaSources Sci. Technol. 22 (2013) 025005 (8pp) [2]: J. Oberrath, R.P. Brinkmann,Plasma Sources Sci. Technol. 23 (2014) 065025 (10p

AB - Active Plasma Resonance Spectroscopy:Evaluation of a uiddynamic-model of the planar multipole resonance probe using func-tional analytic methodsMICHAEL FRIEDRICHS, Institute of Product andProcess Innovation, Leuphana University Lneburg, RALF PETER BRINKMANN,Institute of Theoretical Electrical Engineering, Ruhr-University Bochum,, JENSOBERRATH, Institute of Product and Process Innovation, Leuphana UniversityLneburg | Measuring plasma parameters, e.g. electron density and electron tem-perature, is an important procedure to verify the stability and behavior of a plasmaprocess. For this purpose the multipole resonance probe (MRP) represents a satisfy-ing solution to measure the electron density. However the in uence of the probe onthe plasma through its physical presence makes it unattractive for some processesin industrial application. A solution to combine the bene ts of the spherical MRPwith the ability to integrate the probe into the plasma reactor is introduced bythe planar model of the MRP. By coupling the model of the cold plasma with themaxwell equations for electrostatics an analytical model for the admittance of theplasma is derivated[1 , 2], adjusted to cylindrical geometry and solved analyticallyfor the planar MRP using functional analytic methods. [1]: M. Lapke et al. , PlasmaSources Sci. Technol. 22 (2013) 025005 (8pp) [2]: J. Oberrath, R.P. Brinkmann,Plasma Sources Sci. Technol. 23 (2014) 065025 (10p

KW - Engineering

UR - http://meetings.aps.org/Meeting/GEC16/Session/DT1.2

M3 - Conference abstract in journal

VL - 61

SP - 17

JO - Bulletin of the American Physical Society

JF - Bulletin of the American Physical Society

SN - 0003-0503

IS - 9

ER -