Photochemistry of 2,2', 4,4', %,5'-hexabde (BDE-153) in THF and adsorbed on SiO2: first observation of OH reactivity of BDEs on aerosol
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In: Organohalogen Compounds, Vol. 60, 2004, p. 2256-2261.
Research output: Journal contributions › Conference article in journal › Research
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TY - JOUR
T1 - Photochemistry of 2,2', 4,4', %,5'-hexabde (BDE-153) in THF and adsorbed on SiO2
T2 - 24. international symposium on halogenated environmental organic pollutants and POPs - Dioxin 2004
AU - Zetzsch, Cornelius
AU - Palm, Wolf-Ulrich
AU - Krüger, Heinz-Ulrich
N1 - Conference code: 24
PY - 2004
Y1 - 2004
N2 - BDE-153 (2,2',4,4',5,5'-hexabromo diphenylether) is a component of the flame retardant mixtures penta- and octaBDE and a trace constituent of decaBDE. Furthermore, it may occur as a minor intermediate in the photolysis of decaBDE. We have previously studied the UV spectrum and quantum yield for the photolysis of BDE-153 in tetrahydrofuran (THF) solution3, and we now present a comparison of the photolytic degradation pathways of this symmetrical molecule in solution and adsorbed at sub-monlayer thickness on aerosol particles, made of fused silica (Aerosil 380), in an aerosol smog chamber facility. Furthermore, the aerosol smog chamber technique allows us to expose aerosol-borne compounds to OH radicals, which are known to clean the atmosphere efficiently from air pollutants. Atmospheric residence times of air pollutants can then be assessed from the rate constants for the reaction with OH radicals, and a first, preliminary result on BDE-153 + OH will be presented.
AB - BDE-153 (2,2',4,4',5,5'-hexabromo diphenylether) is a component of the flame retardant mixtures penta- and octaBDE and a trace constituent of decaBDE. Furthermore, it may occur as a minor intermediate in the photolysis of decaBDE. We have previously studied the UV spectrum and quantum yield for the photolysis of BDE-153 in tetrahydrofuran (THF) solution3, and we now present a comparison of the photolytic degradation pathways of this symmetrical molecule in solution and adsorbed at sub-monlayer thickness on aerosol particles, made of fused silica (Aerosil 380), in an aerosol smog chamber facility. Furthermore, the aerosol smog chamber technique allows us to expose aerosol-borne compounds to OH radicals, which are known to clean the atmosphere efficiently from air pollutants. Atmospheric residence times of air pollutants can then be assessed from the rate constants for the reaction with OH radicals, and a first, preliminary result on BDE-153 + OH will be presented.
KW - Chemistry
M3 - Conference article in journal
VL - 60
SP - 2256
EP - 2261
JO - Organohalogen Compounds
JF - Organohalogen Compounds
SN - 1026-4892
Y2 - 6 September 2004 through 10 September 2004
ER -